文摘
ZrO2 film was deposited on Ti6Al4V alloy using the plasma immersion ion implantation and deposition at various bias voltage. The deposited film was characterized by XPS, AFM, Ellipometry, Nano-indentation and Pin-on disk machine. A dense zirconium oxide film with the maximum thickness 108 nm was formed at maximum applied voltage. The hardness and wear resistance of film is much higher as compared to the substrate.