Hydrogen irradiation effect of W thin films prepared by magnetron sputtering deposition

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• 作者：Yong Zhang^a ; Wen Wang^a ; Haitao Ren^b ; Wenjia Han^a ; Fangshu Liu^a ; Jiangang Yu^a ; Shixiang Peng^b ; Kaigui Zhu^a ; ^{kgzhu@buaa.edu.cn}
• 关键词：W thin films ; Magnetron sputtering deposition ; Hydrogen plasma irradiation ; SEM
• 刊名：Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
• 出版年：2013
• 出版时间：15 July, 2013
• 年：2013
• 卷：307
• 期：Complete
• 页码：357-361
• 全文大小：2860 K

文摘

W is regarded as one of the most promising candidate materials for plasma-facing materials in future fusion reactors. For this reason, W is studied in variety of formats, such as W blocks, W alloys, W films. In this work, W thin films were prepared by magnetron sputtering deposition. Different materials were used as the substrates. Hydrogen plasma irradiation effect of the thin films was investigated.