Kinetics mechanism of Ge surface oxidation by ozone at low temperature is experimentally investigated.
The growth process contains initially linear growth region and following parabolic growth region.
The GeOx thickness vs. oxidation time plot obeys the well-known Deal-Grove or linear parabolic model.
The linear growth region includes the oxidation of two topmost Ge layers, and the oxidation of third layer and following layers of Ge is diffusion limited.
The activation energies for linear and parabolic regions are 0.04 and 0.55 eV, respectively.