Characterization and thermal shock behavior of Y2O3 films deposited on freestanding CVD diamond substrates
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- 作者：Chenyi Hua hua07de@163.com" class="auth_mail" title="E-mail the corresponding author ; Jianchao Guo ; Jinglong Liu ; Xiongbo Yan ; Yun Zhao ; Liangxian Chen ; Junjun Wei ; Lifu Hei ; Chengming Li ; chengmli@mater.ustb.edu.cn" class="auth_mail" title="E-mail the corresponding author ; chengmli@sina.com" class="auth_mail" title="E-mail the corresponding author
- 关键词：Y2O3 film ; CVD diamond ; Thermal shock
- 刊名：Applied Surface Science
- 出版年：2016
- 出版时间：15 July 2016
- 年：2016
- 卷：376
- 期：Complete
- 页码：145-150
- 全文大小：1922 K
文摘
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The Y2O3 film strongly adhered to freestanding CVD diamond substrate.
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The Y2O3 film deposited on diamond exhibited excellent resistance to thermal shock.
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The IR transmittance of the samples was improved after thermal shock.
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The transmittance enhancement mechanism was discussed.