Characterization of interface of Al–Ni/a-Si for thin film transistor using high-resolution Rutherford backscattering spectrometry
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- 作者：Chikara Ichihara ; Nobuyuki Kawakami ; Satoshi Yasuno ; Aya Hino ; Kazuhisa Fujikawa ; Akira Kobayashi ; Mototaka Ochi ; Hiroshi Gotoh ; Toshihiro Kugimiya
- 关键词：High-resolution RBS ; Al– ; Ni ; TFT ; Direct contact ; Depth resolution
- 刊名：Micron
- 出版年：2009
- 出版时间：January 2009
- 年：2009
- 卷：40
- 期：1
- 页码：66-69
- 全文大小：516 K
文摘
High-resolution Rutherford backscattering spectrometry (HRBS) in combination with grazing angle argon sputtering was carried out to characterize the interface of aluminum–nickel (Al–Ni) alloy and amorphous-silicon films in a thin film transistor (TFT) for liquid crystal display (LCD). After thinning the top Al–Ni layer by a 1-keV Ar sputtering, the sensitivity of the interface oxygen was improved to be twice higher than that before sputtering. The results revealed that the oxygen at the interface relates to the contact characteristics.