Structural and mechanical characterization of BC_x

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• 作者：Matthias Krause ; Laurent Bedel ; Anthony Taupeau ; Ulrich Kreissig ; Frans Munnik ; Gintautas Abrasonis ; Andreas Kolitsch ; Gyö ; rgy Radnoczi ; Zsolt Czigá ; ny ; Annick Vanhulsel
• 关键词：BC_xN_y ; Thin films ; Hard coatings ; Magnetron sputtering ; Spectroscopy ; Structural properties ; Mechanical properties
• 刊名：Thin Solid Films
• 出版年：2009
• 出版时间：2 November 2009
• 年：2009
• 卷：518
• 期：1
• 页码：77-83
• 全文大小：535 K

文摘

BC_xN_y thin films deposited at 250 °C by pulsed reactive magnetron sputtering of a B₄C target in an Ar/N₂ plasma were studied by elastic recoil detection analysis, Fourier transform infrared, Raman, and photoelectron spectroscopy, electron microscopy, and nanoindentation. In the concentration range of 6 % to 100 % N₂ in the sputter plasma the segregation into nanocrystalline hexagonal boron nitride and amorphous sp² carbon is the dominant process during the film growth. The stoichiometric ratio and structural details of the major phases depend on the N₂ concentration in the plasma and have significant influence on the Young′s modulus and the elastic recovery of the BC_xN_y thin films.