- 作者：S. Menzli ; B. Ben Hamada ; I. Arbi ; A. Souissi ; A. Laribi ; A. Akremi ; a_akremi@yahoo.fr" class="auth_mail" title="E-mail the corresponding author ; C. Chefi
- 关键词：Copper-phthalocyanine ; Si(111)(&radic ; 3 ; × ; ; &radic ; 3)R30° ; Ag surface ; LEED ; XPS ; XPD ; UPS
- 刊名：Applied Surface Science
- 出版年：2016
- 出版时间：30 April 2016
- 年：2016
- 卷：369
- 期：Complete
- 页码：43-49
- 全文大小：2794 K
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Ultra thin films of copper phthalocyanine were grown on class="mathmlsrc">title="View the MathML source" class="mathImg" data-mathURL="/science?_ob=MathURL&_method=retrieve&_eid=1-s2.0-S0169433216302161&_mathId=si1.gif&_user=111111111&_pii=S0169433216302161&_rdoc=1&_issn=01694332&md5=1cf361e40b3046af27d87eb576d19c3f">
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tretchy="false">( 111 tretchy="false">) 3 × 3 30 ° Characterization was conducted in situ by XPS, UPS, XPD and LEED.
For the first layer three domains are observed corresponding to a flat lying adsorption.
UPS results show the existence of an interface dipole and a band bending.