Aspects of native oxides etching on n-GaSb(1 0 0) surface
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- 作者：C. Cotirlan ; cotirlan@infim.ro" class="auth_mail" title="E-mail the corresponding author ; R.V. Ghita ; C.C. Negrila ; C. Logofatu ; F. Frumosu ; G.A. Lungu
- 关键词：GaSb ; Native oxides ; Sputtering ; Etching ; Annealing ; ARXPS
- 刊名：Applied Surface Science
- 出版年：2016
- 出版时间：15 February 2016
- 年：2016
- 卷：363
- 期：Complete
- 页码：83-90
- 全文大小：2939 K
文摘
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A technology for GaSb surface cleaning is proposed.
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The technology combines ion sputtering, chemical etching, annealing for oxide removal.
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The ARXPS studies on GaSb surfaces are presented in a detailed manner.
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The surface stoichiometry is restored after recommended technology for contacting.