Influence of negative bias pulse parameters on accumulation of macroparticles on the substrate immersed in titanium vacuum arc plasma
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- 作者：Alexander I. Ryabchikov ; ralex@tpu.ru" class="auth_mail" title="E-mail the corresponding author ; Peter S. Ananin ; Denis O. Sivin ; Sergey V. Dektyarev ; Anna I. Bumagina ; Alexey E. Shevelev ; Dmitry A. Andriyashin
- 关键词：Vacuum-arc plasma ; Macroparticles ; High-frequency short-pulse negative bias ; Adhesion
- 刊名：Surface and Coatings Technology
- 出版年：2016
- 出版时间：25 November 2016
- 年：2016
- 卷：306
- 期：part_PA
- 页码：251-256
- 全文大小：1150 K
文摘
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Increasing bias pulse frequency leads to linear decrease of the number of macroparticles.
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Increasing bias pulse length leads to linear decrease of the number of macroparticles.
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MP energy balance is defined by ion and secondary electron fluxes, and substrate radiation.
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Cooled vacuum arc MP can be melted in high-voltage plasma sheath.