We investigate an accumulation of macroparticles (MPs) on a substrate immersed in vacuum arc plasma.
The negative high-frequency short-pulsed biasing of a substrate significantly reduces the Ti and Al MPs content on substrate surface.
Several different physical mechanisms of the MPs number decreasing on the negatively biased substrate have been identified.
Among these mechanisms are ion sputtering, enhanced ion sputtering, reflection of MP by a sheath electric field, MPs evaporation on substrate surface and in a sheath.