Titanium macroparticles density decreasing on the sample, immersed in plasma, at repetitively pulsed biasing
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- 作者：D.O. Sivin ; sivin@tpu.ru" class="auth_mail ; A.I. Ryabchikov ; A.I. Bumagina ; O.S. Tupikova ; N.V. Daneikina
- 关键词：Vacuum-arc ; Metal plasma ; Macroparticles ; Negative high-frequency short-pulsed bias ; Plasma immersion ion implantation
- 刊名：Applied Surface Science
- 出版年：15 August 2014
- 年：2014
- 卷：310
- 期：Complete
- 页码：126-129
- 全文大小：1286 K
文摘
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It was found that the MP accumulation on a repetitively biased substrate was uneven over time.
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A significant decrease in the titanium MP deposition rate on the negatively biased substrate at t > 1 min was observed.
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The MP number density on biased substrate decreased 20-fold over the density that resulted from depositing Ti MPs and plasma on the substrate with anode potential after 3 min of process time.
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It was experimentally shown that DC titanium vacuum arc plasma without pre – filtering of MPs can be used for high frequency short pulse plasma immersion Ti ion implantation.