Gene expression profiling data of Schizosaccharomyces pombe under nitrosative stress using differential display

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• 作者：Pranjal Biswas ; Uddalak Majumdar¹ ; Sanjay Ghosh ; ^{sgbioc@caluniv.ac.in" class="auth_mail" title="E-mail the corresponding author} ; ^{ghoshs71@hotmail.com" class="auth_mail" title="E-mail the corresponding author}
• 关键词：Schizosaccharomyces pombe ; Nitric oxide ; Nitrosative stress ; Differential display analysis
• 刊名：Data in Brief
• 出版年：2016
• 出版时间：March 2016
• 年：2016
• 卷：6
• 期：Complete
• 页码：101-111
• 全文大小：812 K

文摘

Excess production of nitric oxide (NO) and reactive nitrogen intermediates (RNIs) causes nitrosative stress on cells. Schizosaccharomyces pombe was used as a model to study nitrosative stress response. In the present data article, we have used differential display to identify the differentially expressed genes in the fission yeast under nitrosative stress conditions. We have used pure NO donor compound detaNONOate at final concentrations of 0.1 mM and 1 mM to treat the cells for 15 min alongside control before studying their gene expression profiles. At both the treated conditions, we identified genes which were commonly repressed while several genes were induced upon both 0.1 mM and 1 mM treatments. The differentially expressed genes were further analyzed in DAVID and categorized into several different pathways.