Non-contact charge-voltage method for dielectric characterization on small test areas of IC product wafers

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• 作者：Piotr Edelman ; Dmitriy Marinskiy ; Carlos Almeida ; Joseph N. Kochey ; Anton Byelyayev ; Marshall Wilson ; Alexandre Savtchouk ; John D’ ; Amico ; Andrew Findlay ; Lubek Jastrzebski and Jacek Lagowski
• 关键词：Non-contact ; CV ; Scribe line testing ; Advanced dielectrics ; Corona discharge ; Kelvin force
• 刊名：Materials Science in Semiconductor Processing
• 出版年：2006
• 出版时间：February-June 2006
• 年：2006
• 卷：9
• 期：1-3
• 页码：252-256
• 全文大小：258 K

文摘

We present an electric characterization method for monitoring dielectrics on miniature 50 μm×70 μm scribe line test sites of semiconductor IC product wafers. The method is an extension to micro-scale of the corona–Kelvin metrology used for much larger sites of about 5 mm in diameter. A miniaturization of the corona charging and of the Kelvin probe is accomplished without a sacrifice in precision or repeatability. The apparatus incorporates a machine vision system for identification of test sites. The micro-testing is demonstrated using advanced gate dielectrics and key electrical parameters, i.e., dielectric capacitance, leakage, dielectric charge and flatband voltage. Monitoring is non-contact and it adds no contaminants or particulates. Therefore, after measurement, the product wafer can be returned to the fab-line for further processing.