Basic electronic properties of two-dimensional electron gas (2DEG) formed at GaN/AlGaN hetero-interface in large-scale (100mm) wafer made by metal organic chemical vapour deposition (MOCVD) have been reported and discussed. From conventional Hall measurements, highest electron mobility was found to be
μe1680 and 9000cm
2/Vs at room temperature and at
5K, respectively, for sheet electron density of
ns8×10
12cm
−2. In magneto-resistance (MR) measurements carried out at 1.5K in Hall bar sample defined by photolithography and ion implantation, very clear Schubnikov de-Haas oscillations and integer quantum Hall effect were observed in diagonal (
Rxx) and off-diagonal (
Rxy) resistances, respectively. In addition, a good insulating nature of GaN layer is confirmed by capacitance–voltage (
C–
V) measurement. These results suggest the high-qualitiness of our 100mm GaN/AlGaN high electron mobility transistor (HEMT) wafers comparable to those so far reported.