High-quality two-dimensional electron gas at large scale GaN/AlGaN wafer interface prepared by mass production MOCVD systems
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文摘
Basic electronic properties of two-dimensional electron gas (2DEG) formed at GaN/AlGaN hetero-interface in large-scale (100mm) wafer made by metal organic chemical vapour deposition (MOCVD) have been reported and discussed. From conventional Hall measurements, highest electron mobility was found to be μe1680 and 9000cm2/Vs at room temperature and at 5K, respectively, for sheet electron density of ns8×1012cm−2. In magneto-resistance (MR) measurements carried out at 1.5K in Hall bar sample defined by photolithography and ion implantation, very clear Schubnikov de-Haas oscillations and integer quantum Hall effect were observed in diagonal (Rxx) and off-diagonal (Rxy) resistances, respectively. In addition, a good insulating nature of GaN layer is confirmed by capacitance–voltage (CV) measurement. These results suggest the high-qualitiness of our 100mm GaN/AlGaN high electron mobility transistor (HEMT) wafers comparable to those so far reported.

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