Surface chemistry of electrodeposited Cu₂O films studied by XPS

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• 作者：Changqiong Zhu ; Anna Osherov ; Matthew J. Panzer
• 关键词：Cuprous oxide ; Electrodeposition ; Surface characterization ; Impurities ; Electrical properties
• 刊名：Electrochimica Acta
• 出版年：30 November, 2013
• 年：2013
• 卷：111
• 期：Complete
• 页码：771-778
• 全文大小：3269 K

文摘

The surfaces of electrodeposited Cu₂O films grown using a variety of solution conditions have been examined using X-ray photoelectron spectroscopy (XPS). Sodium and carbon are identified as impurities in certain films. Cu₂O films deposited from basic solutions using lactate or citrate ligands contain more impurities than films deposited from acidic lactate or acetate solutions. Depth profiling reveals that sodium is located as deep as 100 nm below the surface of one film in the form of NaOCu bonds. Sodium content can be correlated with preferred orientation of the polycrystalline films, with strongly 銆? 1 1銆?orientated films containing the largest amounts of sodium. Prior to ion sputtering, Cu₂O/eutectic gallium-indium junctions display rectifying current-voltage behavior, with films containing larger amounts of impurities displaying lower photocurrent and open circuit voltage values. After sputtering the Cu₂O surface to remove the impurities, symmetric current-voltage behavior is observed.