Metalorganic vapor phase epitaxy of ternary rhombohedral Se3 solid solutions
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Epitaxial a394836a51d03186ecebceb66fc0" title="Click to view the MathML source">(Bi2Se3) films were grown on the sapphire substrate by MOVPE at 460 °C.

Rhombohedral and orthorhombic films of (Bi1−xSbx)2Se3 were deposited at 480 °C.

Rhombohedral (Bi4Se3) and Bi phases were obtained at lower temperatures.

Characterization of the films was carried out by Raman, XRD, AFM, SEM and EDS techniques.

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