Reactive plasma deposition of high quality single phase CuO thin films suitable for metal oxide solar cells

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• 作者：Zhenzhen Li^a ; ^b ; Kemeng Tong^a ; ^b ; Ruifang Shi^c ; Yonglong Shen^a ; ^b ; Yiqiang Zhang^a ; ^b ; Zhiqiang Yao^a ; ^b ; Jiajie Fan^a ; ^b ; ^{fanjiajie@zzu.edu.cn} ; Mike Thwaites^a ; ^b ; Guosheng Shao^a ; ^b ; ^d ; ^{gsshao@zzu.edu.cn}
• 关键词：CuO thin films ; Room temperature sputtering deposition ; Remote plasma sputtering ; Optoelectronic properties ; Tuning of hole concentration
• 刊名：Journal of Alloys and Compounds
• 出版年：2017
• 出版时间：25 February 2017
• 年：2017
• 卷：695
• 期：Complete
• 页码：3116-3123
• 全文大小：2618 K
• 卷排序：695

文摘

Dense single phase CuO thin films are prepared by a remote plasma sputtering. The films were polycrystalline without evident preference in crystal orientations. All of the p-type CuO thin films exhibited indirect optical bandgap about 1.5 eV. The hole concentrations could be readily tailored from 1017 to 1022 cm−3. The refined tuning is critical in engineering delivery of CuO-based solar cells.