Effect of vacuum magnetic annealing on the structural and physical properties of the Ni and Al co-doped ZnO films

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• 作者：Mingpeng Yu ; Hong Qiu ; Xiaobai Chen
• 关键词：Ni and Al co-doped Zinc oxide ; Thin films ; Magnetic annealing ; Structural properties ; Ferromagnetism ; Carrier transport ; Magnetization behavior ; Sputtering
• 刊名：Thin Solid Films
• 出版年：2010
• 出版时间：30 September 2010
• 年：2010
• 卷：518
• 期：23
• 页码：7174-7182
• 全文大小：1440 K

文摘

About 300 nm-thick Zn_0.87Al_0.06Ni_0.07O, Zn_0.83Al_0.06Ni_0.11O and Zn_0.81Al_0.04Ni_0.15O films were deposited on glass substrates at 300 K by co-sputtering ZnO:Al and Ni targets. The films were annealed in vacuum at 673 K for 2 h under a magnetic field of 4.8 × 10⁴ A/m applied along the film plane and then were cooled down to room temperature without magnetic field. All the films have a wurtzite structure and consist of thin columnar grains perpendicular to the substrate. The annealing promotes the (002) orientation growth in the film growing direction for the Zn_0.87Al_0.06Ni_0.07O and Zn_0.83Al_0.06Ni_0.11O films as well as the (100) orientation growth for the Zn_0.81Al_0.04Ni_0.15O film. The annealing results in a slight increase in the grain size. A weak Ni diffraction peak was detected for the annealed films with high Ni content. The annealing enhances the room temperature ferromagnetism of the films. A temperature dependence of magnetization confirms that the Curie temperature is above 400 K for the annealed films. The films magnetically annealed exhibit an anisotropic magnetization behavior. The annealed Zn_0.87Al_0.06Ni_0.07O film has the lowest resistivity (8.73 × 10⁻³ Ω cm), the highest free electron concentration (1.73 × 10²⁰ cm^− 3) and Hall mobility (4.16 cm²V^− 1 s^− 1). A temperature dependence of the resistivity from 50 K to 300 K reveals that the carrier transport mechanism is Mott's variable range hopping in the low temperature range and thermally activated band conduction in the high temperature range.