A 1480/1064 nm dual wavelength photo-thermal etching system for non-contact three-dimensional microstructure generation into agar microculture chip

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• 作者：Hattori ; Akihiro ; Moriguchi ; Hiroyuki ; Ishiwata ; Shin’ ; ichi ; Yasuda ; Kenji
• 关键词：Dual wavelength photo-thermal etching ; Agar microchamber ; 1480/1064nm infrared focused beam ; Flexible change of structure
• 刊名：Sensors and Actuators B: Chemical
• 出版年：2004
• 出版时间：May 15, 2004
• 年：2004
• 卷：100
• 期：3
• 页码：467-474
• 全文大小：419 K

文摘

We have developed a new type of non-contact three-dimensional photo-thermal etching method for agar microculture chips exploiting the characteristics of two different wavelengths of infrared laser beams. We used two different wavelengths of infrared (1480 and 1064nm) focused laser beam as a heat source to melt and remove a portion of 200μm high agar gel layer on the 5nm thick chromium-coated glass slide. As the 1480nm infrared beam is absorbed by water, the agar gel on the light pathway is heated and melted. On the other hand, as the 1064nm infrared beam is not absorbed by water and agar, the melting of the agar occurred just near the chromium thin layer that absorbs 1064nm infrared light. Using this non-contact etching, we can easily make microstructures in agar-layer using infrared laser beam only within a few minutes; i.e. cell-culture holes are melted by 100mW, 1480nm laser and tunnels by 100μm/s, 40mW, 1064nm laser, respectively. The size of holes and tunnels were also controlled by choosing the irradiation power and time of infrared lasers. Those results indicate that we can make and use microstructures for biological use without any expensive microfablication facilities nor a series of complicated procedure and time.