Rapid growth of diamond and its morphology by in-liquid plasma CVD
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- 作者：Y. Haradaa ; ; R. Hishinumab ; c ; C. Terashimac ; H. Uetsukaa ; c ; K. Nakatab ; c ; T. Kondob ; c ; M. Yuasab ; c ; A. Fujishimac
- 关键词：Diamond ; Plasma CVD ; In-liquid plasma ; High growth rate ; Morphology
- 刊名：Diamond & Related Materials
- 出版年：2016
- 出版时间：March 2016
- 年：2016
- 卷：63
- 期：Complete
- 页码：12-16
- 全文大小：956 K
文摘
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A novel diamond growth method called as “in-liquid plasma CVD (ILPCVD)” was studied.
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Considerable growth rate of 170 μm/h was achieved.
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Shapes of diamond were changed by process conditions.
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The growth mechanism of ILPCVD is similar to conventional gas phase CVD method.
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Morphology of diamond films by ILPCVD will be controlled.