Highly sensitive optical interferometric technique reveals stress-dependent instantaneous nanometric growth fluctuations of Chinese chive leaf under heavy metal stress
Nanometric Intrinsic Fluctuation (NIF) in plants is sensitive to heavy metal exposure. NIF showed reductions under Cd exposure. Increment in NIF was observed under Zn exposure. Statistical Interferometry Technique (SIT) is suitable for fast, in-situ monitoring of Cd and Zn stress in plants.