Oxidation of tungsten nanoclusters

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• 作者：Gillet ; M. ; Ma&scaron ; ek ; K. ; Lemire ; C.
• 关键词：Tungsten oxide ; Reflection high-energy electron diffraction ; Atomic force microscopy ; Tungsten thin film
• 刊名：Thin Solid Films
• 出版年：2003
• 出版时间：November 1, 2003
• 年：2003
• 卷：444
• 期：1-2
• 页码：9-16
• 全文大小：2.00 M

文摘

The tungsten oxide nanoclusters were prepared by oxidation of epitaxialy grown tungsten thin film. The structure and morphology of tungsten and tungsten oxide nanoclusters were determined by RHEED (Reflection High-Energy Electron Diffraction) and AFM (Atomic Force Microscopy). The crystallographic structure and epitaxial relationships were evaluated. Annealing at the temperatures of 950 °C and 1150 °C gave rise to the tungsten clusters having (110) and (111) epitaxial planes, respectively. The two phases of tungsten oxide—WO₂ and WO₃—were found in dependence of oxidation conditions. The oxide clusters were epitaxially oriented on the α-Al₂O₃ substrate. The epitaxial orientations were deduced from the RHEED pattern and the surface distribution of clusters was characterised by AFM.