Contact end resistance test structure applied for nanocontact measurements

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• 作者：J. Sant ; er ; I. Martin-Fern ; ez ; X. Borris¨¦ ; G. Rius ; C. Can¨¦
• 关键词：Nanocontact ; Contact resistance ; Test structure
• 刊名：Microelectronic Engineering
• 出版年：2012
• 出版时间：November, 2012
• 年：2012
• 卷：99
• 期：Complete
• 页码：18-22
• 全文大小：490 K

文摘

This paper presents an accurate method and test structure to evaluate ohmic nanocontacts. The procedure permits the characterization of the contact resistance between standard-in-microtechnology interconnect lines and a certain nanoscaled-in-width object. It is based on the adaption of the classic contact end resistance structure used for the measurement of the contact end resistance in microelectronic technologies. After the theoretical model study, the methodology is validated for the single-walled carbon nanotube case.