Formation of nanostructures on HOPG surface in presence of surfactant atom during low energy ion irradiation

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• 作者：M. Ranjan ; ^{ranjanm@ipr.res.in" class="auth_mail" title="E-mail the corresponding author} ; P. Joshi ; S. Mukherjee
• 关键词：Graphite ; Surfactant ; Nanopatterns ; Ion irradiation ; Sputtering yield
• 刊名：Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
• 出版年：2016
• 出版时间：15 July 2016
• 年：2016
• 卷：379
• 期：Complete
• 页码：57-61
• 全文大小：1301 K

文摘

Low energy ions beam often develop periodic patterns on surfaces under normal or off-normal incidence. Formation of such periodic patterns depends on the substrate material, the ion beam parameters, and the processing conditions. Processing conditions introduce unwanted contaminant atoms, which also play strong role in pattern formation by changing the effective sputtering yield of the material. In this work we have analysed the effect of Cu, Fe and Al impurities introduced during low energy Ar⁺ ion irradiation on HOPG substrate. It is observed that by changing the species of foreign atoms the surface topography changes drastically. The observed surface topography is co-related with the modified sputtering yield of HOPG. Presence of Cu and Fe amplify the effective sputtering yield of HOPG, so that the required threshold for the pattern formation is achieved with the given fluence, whereas Al does not lead to any significant change in the effective yield and hence no pattern formation occurs.