文摘
Electron beam physical vapor deposition (EB-PVD) has been used to deposit thin film (YSZ) electrolytes on NiO-YSZ composite substrates pre-sintered at 1100 °C, followed by further sintering at 1400 °C in order to achieve dense films. Surface morphology of deposited layers has been investigated by AFM and FE-SEM. Increasing the deposition time and YSZ films thickness results in higher roughness and mean particle size of the thin film layer. FE-SEM observations of fresh fractured anodic half cells confirmed dense, crack-free, homogeneous and intensely adhered YSZ electrolyte layers. Sintering behavior of NiO and YSZ grains has been also investigated by the micrographs of cross sections of NiO-YSZ substrates.