The non-polar -oriented a-plane AlGaN epi-layers were grown by MOCVD.
Si-induced strain relaxation in the non-polar AlGaN epi-layers can be promoted.
The crystal quality for both AlGaN epi-layers can be improved by Si-doping.
Si-doping efficiency of AlGaN samples was degraded at SiH4 flow rate of 40 sccm.