Effects of Si-doping on structural, electrical, and optical properties of polar and non-polar AlGaN epi-layers
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文摘

The non-polar View the MathML source-oriented a-plane AlGaN epi-layers were grown by MOCVD.

Si-induced strain relaxation in the non-polar AlGaN epi-layers can be promoted.

The crystal quality for both AlGaN epi-layers can be improved by Si-doping.

Si-doping efficiency of AlGaN samples was degraded at SiH4 flow rate of 40 sccm.

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