Effect of the plasma excitation power on the properties of SiOxCyHz films deposited on AISI 304 steel
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文摘
a-C:H:Si:O films were produced by PECVD. A polydimethylsiloxane-like structure at low plasma power becomes more inorganic at high power. A ten-thousand-fold increase in the total system resistance was achieved in electrochemical testing.

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