Residual stress and texture in Aluminum doped Zinc Oxide layers deposited by reactive radio frequency magnetron sputtering
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- 作者：C.L. Azanza Ricardoa ; Cristy.Azanza@ing.unitn.it" class="auth_mail" title="E-mail the corresponding author ; M. Pastorellia ; M. D'Incaua ; P. Aswathb ; P. Scardia
- 关键词：Aluminum-doped Zinc Oxide ; Reactive sputtering ; X-ray diffraction
- 刊名：Thin Solid Films
- 出版年：2016
- 出版时间：30 April 2016
- 年：2016
- 卷：605
- 期：Complete
- 页码：169-172
- 全文大小：928 K
文摘
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Al doped ZnO thin films were obtained by reactive radio frequency magnetron sputtering.
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Correlation of stresses and texture with electrical and optical properties is shown.
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Homogeneous and stress-free thin-films are the best performing ones.
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XANES confirmed the doping mechanism and excluded some spurious phases.