Surface patterning in GeSe amorphous layers
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文摘
Laser-induced surface relief patterns were performed in GeSe amorphous layers. Compositional and fabrication method dependences on recording were established. Modulation depth of the created structures increases with increasing Se content. Advantage of pulsed laser deposition in comparison to thermal evaporation is shown. Thermal annealing has essential influence on the pattering parameters.

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