Magnetic antidot arrays using SiO2 filled diblock copolymer micelles as ion etching mask
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文摘
We present a simple method for the production of magnetic antidot arrays utilizing polystyrene-poly-2-vinylpyridine micelles filled with amorphous 2d562f87d33b30ac4fefa3ab"" title=""Click to view the MathML source"">SiO2. By dip coating, a micellar monolayer is deposited onto Co/Pt multilayers. A hexagonal pattern with periodicity of 80 nm is obtained. By Ar+ ion etching the micelle layer is transformed into an antidot array due to preferred sputtering of the SiO2 core. Further ion bombardment transfers the pattern into the magnetic film and leads to a reorientation of the perpendicular to in-plane easy axis which is attributed to intermixing of the Co/Pt multilayers.

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