P-I-N amorphous silicon for thin-film light-addressable potentiometric sensors
详细信息    查看全文
文摘
<dl class="listitem" id="list_lis0005"><dt class="label">•dt><dd>

d="par0005">P-I-N stacked a-Si layers structure on glass is firstly applied in LAPS.

dd><dt class="label">•dt><dd>

d="par0010">Photovoltage of P-I-N a-Si LAPS is much higher than conventional a-Si LAPS.

dd><dt class="label">•dt><dd>

d="par0015">pH sensitivity is 40 mV/pH for NbOx layer on P-I-N a-Si LAPS.

dd><dt class="label">•dt><dd>

d="par0020">Signal-to-noise ratio can be improved in high ac frequency modulation of red laser illumination by P-I-N a-Si LAPS, which is benefit for high-speed chemical image.

dd>dl>

© 2004-2018 中国地质图书馆版权所有 京ICP备05064691号 京公网安备11010802017129号

地址:北京市海淀区学院路29号 邮编:100083

电话:办公室:(+86 10)66554848;文献借阅、咨询服务、科技查新:66554700