Low-cost laser printable photomask: One-step, photoresist-free, fully solution processed high-grade photolithography mask
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- 关键词：Photomask ; Laser process ; Organometallics ; Photolithography ; Solution process
- 刊名：Applied Surface Science
- 出版年：2017
- 出版时间：1 February 2017
- 年：2017
- 卷：394
- 期：Complete
- 页码：466-471
- 全文大小：1607 K
- 卷排序：394
文摘
Fully solution-based one-step direct fabrication method of high-grade photomask. Laser-induced thermochemical metallization of optically catalyzed hybrid complex. High selectivity, retroreflective structure generation, excellent optical surface. Performance comparable to conventional photomasks fabrication method. Improvement of both resultant agility and productivity of photolithography.