TiN deposition and morphology control by scalable plasma-assisted surface treatments

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• 作者：Oleg Baranov^a ; ^{olbaranov@yahoo.com} ; Jinghua Fang^b ; Kostya (Ken) Ostrikov^c ; ^d ; Uro&scaron ; Cvelbar^e
• 关键词：Thin films ; Physical vapour deposition (PVD) ; Sputtering ; Arc discharges
• 刊名：Materials Chemistry and Physics
• 出版年：2017
• 出版时间：15 February 2017
• 年：2017
• 卷：188
• 期：Complete
• 页码：143-153
• 全文大小：5568 K
• 卷排序：188

文摘

Processes related to efficient interaction of fluxes with materials are studied. Formation of ion fluxes by magnetic fields of two configurations is elaborated. Arc configuration provides control over the substrate used to generate plasma. Bottle configuration controls fluxes extracted from plasma of external source. The magnetic control allows scalable surface treatment over large area.