Surface structure and electric properties of nitrogen incorporated NCD films

详细信息    查看全文

• 作者：Qi Sun^a ; ^{anitasun2015@163.com} ; Jianhua Wang^a ; ^b ; ^{WangJianhuaWIT@163.com} ; Jun Weng^a ; ^{951152515@qq.com} ; Fan Liu^a ; ^{84312739@qq.com}
• 关键词：Nitrogen rich plasma ; N incorporated ; Electric performance ; NCD
• 刊名：Vacuum
• 出版年：2017
• 出版时间：March 2017
• 年：2017
• 卷：137
• 期：Complete
• 页码：155-162
• 全文大小：3087 K
• 卷排序：137

文摘

Conductive N-doped NCD films were deposited in nitrogen rich plasma. Chemical bonds and fraction of sp2 carbon atoms was varied with different N2concetration. Smaller grain size of deposited films was corresponding to better conductivity. Fraction of doped nitrogen atoms increased while nitrogen concentration increased. With different N2 concentration the sum value of pyridinic-N and pyrrolic-N was fixed.