Photo-Fenton treatment of valproate under UVC, UVA and simulated solar radiation

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• 作者：Daniel Haranaka Funai^a ; Florian Didier^b ; Jaime Gimé ; nez^c ; Santiago Esplugas^c ; ^{santi.esplugas@ub.edu} ; Pilar Marco^c ; Amilcar Machulek Junior^a
• 关键词：Valproic acid ; Photo-Fenton ; UVC ; UVA and solar simulated radiation
• 刊名：Journal of Hazardous Materials
• 出版年：2017
• 出版时间：5 February 2017
• 年：2017
• 卷：323
• 期：part_PA
• 页码：537-549
• 全文大小：1805 K
• 卷排序：323

文摘

High rates of Valproate and TOC removal were obtained using low concentration of iron. Photo-Fenton degradation products of Valproate were identified. Electrical cost estimation demonstrated that both BLB and UVC are profitable options for degrading VA via photo-Fenton.