Profile measurement of thin films by backpropagation of multiple-wavelength optical fields with two sinusoidal phase-modulating interferometers
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- 作者：Osami Sasaki ; osami@eng.niigata-u.ac.jp" class="auth_mail" title="E-mail the corresponding author ; Jian Xin t10e173h@mail.cc.niigata-u.ac.jp" class="auth_mail" title="E-mail the corresponding author ; Samuel Choi schoi@eng.niigata-u.ac.jp" class="auth_mail" title="E-mail the corresponding author ; Takamasa Suzuki takamasa@eng.niigata-u.ac.jp" class="auth_mail" title="E-mail the corresponding author
- 关键词：Interferometry ; Interferometer ; Wavelength scanning ; Sinusoidal phase modulation ; Profilometry ; Optical metrology
- 刊名：Optics Communications
- 出版年：2015
- 出版时间：1 December 2015
- 年：2015
- 卷：356
- 期：Complete
- 页码：578-581
- 全文大小：994 K
文摘
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Two wavelength-scanning interferometers with a same light source were employed.
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They measure the scanned wavelength and a shape of thin film, respectively.
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The backpropagation method was used to obtain the surface positions of the thin film.
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The measurement error of the scanned wavelength was less than 0.05 nm.
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The measurement repeatability of the surface positions was less than about 5nm.