Growth and characterisation of Ga(NAsBi) alloy by metal-organic vapour phase epitaxy
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文摘

GaNAsBi MQWs and single layers grown by metal–organic vapour phase epitaxy.

Linear relationship between N content and UDMHy supply, Bi content independent of N.

Good chemical homogeneity and relatively sharp heterointerfaces can be achieved.

Photoreflectance spectroscopy shows reduction of band gap by 141±22 meV/% N.

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