A study of ultrasonic spray pyrolysis deposited rutile-TiO₂-based metal-semiconductor-metal ultraviolet photodetector

详细信息    查看全文

• 作者：Han-Yin Liu^a ; ^{hyliu@fcu.edu.tw" class="auth_mail" title="E-mail the corresponding author} ; Wei-Hsun Lin^a ; Wen-Ching Sun^b ; Sung-Yen Wei^b ; Sheng-Min Yu^b
• 关键词：Metal-semiconductor-metal (MSM) ; Photodetector ; Rutile ; Titanium dioxide (TiO2) ; Ultraviolet
• 刊名：Materials Science in Semiconductor Processing
• 出版年：2017
• 出版时间：January 2017
• 年：2017
• 卷：57
• 期：Complete
• 页码：90-94
• 全文大小：1007 K

文摘

This work uses ultrasonic spray pyrolysis deposition to grow the TiO₂ film on a Si substrate. The TiO₂ film was annealed at 800 °C for 2 h to form rutile phase. X-ray diffraction, Raman spectrum, X-ray photoelectron spectroscopy were used to characterized rutile phase TiO₂. The optical characteristics like refractive index, extinction coefficient and absorption coefficient were measured. The rutile TiO₂-based metal-semiconductor-metal ultraviolet photodetector was fabricated and investigated, including current-voltage characteristic, photoresponsivity, external quantum efficiency, response time, noise equivalent power, and detectivity.