The effects of annealing temperature on characteristics of UBMS sputtered CNx films for protective coatings

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• 作者：Yong Seob Park ; Jin-Hyo Boo ; Byungyou Hong
• 关键词：A. amorphous materials ; A. thin films ; B. sputtering ; C. Raman spectroscopy ; C. atomic force microscopy ; D. surface properties
• 刊名：Materials Research Bulletin
• 出版年：2012
• 出版时间：October, 2012
• 年：2012
• 卷：47
• 期：10
• 页码：2776-2779
• 全文大小：583 K

文摘

The carbon nitride (CNx) films have been prepared by unbalanced magnetron sputtering (UBMS) at room temperature. The deposited CNx films have been post-annealed at temperatures ranging from 300 ¡ãC to 700 ¡ãC in increments of 200 ¡ãC using rapid thermal annealing (RTA) equipment in vacuum ambient. We investigated the effects of rapid thermal annealing on the structural, surface, and physical properties of CNx films for application of protective coatings. As the result, the increasing annealing temperature led to a decline in physical properties of CNx films such as hardness, elastic modulus, adhesion, frication coefficient, and surface roughness, however it is attributed to the improvement of the residual stress in the film. These results are related to the ordering of sp² bonded clustering and the increase of disordered graphite domain by the desorption of N contents in the films, Specially, high annealing temperature over 700 ¡ãC is attributed to the graphitization of film.