Effect of substrate bias and temperature on magnetron sputtered CrSiN films

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• 作者：Shuyong Tan ; Xuhai Zhang ; Xiangjun Wu ; Feng Fang ; Jianqing Jiang
• 关键词：CrSiN film ; DC magnetron sputtering ; Substrate bias ; Substrate temperature
• 刊名：Applied Surface Science
• 出版年：2011
• 出版时间：1 January 2011
• 年：2011
• 卷：257
• 期：6
• 页码：1850-1853
• 全文大小：777 K

文摘

The combine influence of substrate temperature and bias on microstructure and mechanical properties of CrSiN film was examined. The silicon content and phase constitutions of the films are independent on substrate temperature and bias. The crystal preferred orientation is controlled by substrate bias but unrelated to substrate temperature. The influence of bias (0 V to −300 V) on hardness is more obvious than that of the substrate temperature (100–500 °C).