Heating of polymer substrate by discharge plasma in radiofrequency magnetron sputtering deposition

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• 作者：Lucel Sirghi ; Gheorghe Popa ; Yoshinori Hatanaka
• 关键词：Polymer surface ; Substrate heating ; Radiofrequency magnetron sputtering deposition ; Surface buckling instability
• 刊名：Thin Solid Films
• 出版年：2006
• 出版时间：5 December 2006
• 年：2006
• 卷：515
• 期：4
• 页码：1334-1339
• 全文大小：214 K

文摘

The substrate used for the thin film deposition in a radiofrequency magnetron sputtering deposition system is heated by the deposition plasma. This may change drastically the surface properties of the polymer substrates. Deposition of titanium dioxide thin films on polymethyl methacrylate and polycarbonate substrates resulted in buckling of the substrate surfaces. This effect was evaluated by analysis of atomic force microscopy topography images of the deposited films. The amount of energy received by the substrate surface during the film deposition was determined by a thermal probe. Then, the results of the thermal probe measurements were used to compute the surface temperature of the polymer substrate. The computation revealed that the substrate surface temperature depends on the substrate thickness, discharge power and substrate holder temperature. For the case of the TiO₂ film depositions in the radiofrequency magnetron plasma, the computation indicated substrate surface temperature values under the polymer melting temperature. Therefore, the buckling of polymer substrate surface in the deposition plasma may not be regarded as a temperature driven surface instability, but more as an effect of argon ion bombardment.