RF compensation of single Langmuir probe in low density helicon plasma
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- 作者：Soumen Ghosh ; soumen@ipr.res.in" class="auth_mail" title="E-mail the corresponding author ; soumen08phy@gmail.com" class="auth_mail" title="E-mail the corresponding author ; Prabal K. Chattopadhyay ; Joydeep Ghosh ; Dhiraj Bora
- 关键词：RF compensation ; Langmuir probe ; Self resonance choke ; Electron temperature ; EEPF
- 刊名：Fusion Engineering and Design
- 出版年：2016
- 出版时间：15 November 2016
- 年：2016
- 卷：112
- 期：Complete
- 页码：915-918
- 全文大小：793 K
文摘
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Appropriate density and temperature measurement with Langmuir probe in RF Eenvironment.
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Necessity of large auxiliary electrode for RF compensation at low densities (∼1016 m−3).
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Measured two temperature electrons in low pressure helicon antenna produced RF plasma.
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Tail electrons are localized only at off-axis in our cylindrical plasma system.