Formation of nanostructured metallic glass thin films upon sputtering

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• 作者：Sergey V. Ketov^a ; ^{ketov.sergey@wpi-aimr.tohoku.ac.jp} ; Rastko Joksimovic^a ; Guoqiang Xie^b ; Artem Trifonov^c ; ^d ; ^e ; Kazue Kurihara^a ; Dmitri V. Louzguine-Luzgin^a
• 关键词：Engineering ; Materials science ; Nanotechnology
• 刊名：Heliyon
• 出版年：2017
• 出版时间：January 2017
• 年：2017
• 卷：3
• 期：1
• 全文大小：2196 K
• 卷排序：3

文摘

Morphology evolution of the multicomponent metallic glass film obtained by radio frequency (RF) magnetron sputtering was investigated in the present work. Two modes of metallic glass sputtering were distinguished: smooth film mode and clustered film mode. The sputtering parameters, which have the most influence on the sputtering modes, were determined. As a result, amorphous Ni-Nb thin films with a smooth surface and nanoglassy structure were deposited on silica float glass and Si substrates. The phase composition of the target appeared to have a significant influence on the chemical composition of the deposited amorphous thin film. The differences in charge transport and nanomechanical properties between the smooth and nanoglassy Ni-Nb film were also determined.