Verification of the sputter-generated ³²SF_n⁻ (n = 1-6) anions by accelerator mass spectrometry

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• 作者：R.G. Mane^a ; P. Surendran^a ; Sanjay Kumar^b ; J.P. Nair^a ; M.L. Yadav^a ; M. Hemalatha^c ; R.G. Thomas^a ; K. Mahata^a ; S. Kailas^c ; ^d ; A.K. Gupta^a ; ^{anit@tifr.res.in" class="auth_mail" title="E-mail the corresponding author}
• 关键词：Molecular anions ; Sputtering ; Accelerator mass spectrometry
• 刊名：Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
• 出版年：2016
• 出版时间：1 January 2016
• 年：2016
• 卷：366
• 期：Complete
• 页码：13-18
• 全文大小：1470 K

文摘

Recently, we have performed systematic Secondary Ion Mass Spectrometry (SIMS) measurements at our ion source test set up and have demonstrated that gas phase ³²SF_n⁻ (n = 1–6) anions for all size ‘n’ can be readily generated from a variety of surfaces undergoing Cs⁺ ion sputtering in the presence of high purity SF₆ gas by employing the gas spray-cesium sputter technique. In our SIMS measurements, the isotopic yield ratio ³⁴SF_n⁻/³²SF_n⁻ (n = 1–6) was found to be close to its natural abundance but not for all size ‘n’. In order to gain further insight into the constituents of these molecular anions, ultra sensitive Accelerator Mass Spectrometry (AMS) measurements were conducted with the most abundant ³²SF_n⁻ (n = 1–6) anions, at BARC-TIFR 14 UD Pelletron accelerator. The results from these measurements are discussed in this paper.