Full-atomistic nanoscale modeling of the ion beam sputtering deposition of SiO2 thin films
详细信息 查看全文
- 作者：F.V. Grigoriev ; fedor.grigoriev@gmail.com" class="auth_mail" title="E-mail the corresponding author ; A.V. Sulimov ; E.V. Katkova ; I.V. Kochikov ; O.A. Kondakova ; V.B. Sulimov ; A.V. Tikhonravov
- 关键词：Optical films ; Ion beam sputtering ; Deposition ; Molecular dynamics ; Silica glass
- 刊名：Journal of Non-Crystalline Solids
- 出版年：2016
- 出版时间：15 September 2016
- 年：2016
- 卷：448
- 期：Complete
- 页码：1-5
- 全文大小：472 K
文摘
- •
DESIL force field reproduces structure of glassy silica.
- •
Deposited film density exceeds the density of glassy silica.
- •
Concentration of the point defects decreases with thickness of film.
- •
Film density increases with energy of the deposited atoms.