Advantage of dual-confined plasmas over conventional and facing-target plasmas for improving transparent-conductive properties in Al doped ZnO thin films
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- 作者：Long Wena ; Manish Kumara ; manishk@skku.edu" class="auth_mail" title="E-mail the corresponding author ; B.B. Sahua ; S.B. Jina ; C. Sawangratb ; K. Leksakulc ; J.G. Hana ; c ; hanjg@skku.edu" class="auth_mail" title="E-mail the corresponding author
- 关键词：Plasma diagnostics ; Optical emission spectroscopy ; Transparent conductive oxides ; DC sputtering
- 刊名：Surface and Coatings Technology
- 出版年：2015
- 出版时间：25 December 2015
- 年：2015
- 卷：284
- 期：Complete
- 页码：85-89
- 全文大小：839 K
文摘
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Developed advanced DC magnetron sputtering system to deposit highly conductive and transparent Al doped ZnO thin films.
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Presented plasma diagnostics using OES, net current density and thermal energy transfer at substrate location.
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Presented the effects of partial pressure and power density on transparent-conductive performances.
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Shown the advantage of present process over conventional DC magnetron sputtering systems.