Adjustment of plasma properties in magnetron sputtering by pulsed powering in unipolar/bipolar hybrid pulse mode
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- 作者：Stephan Barth ; stephan.barth@fep.fraunhofer.de" class="auth_mail" title="E-mail the corresponding author ; Hagen Bartzsch ; Daniel Glö ; ß ; Peter Frach ; Matthias Gittner ; Rainer Labitzke
- 关键词：Pulse magnetron sputtering ; Sputter deposition ; Plasma properties ; Stress control ; AlN
- 刊名：Surface and Coatings Technology
- 出版年：2016
- 出版时间：25 March 2016
- 年：2016
- 卷：290
- 期：Complete
- 页码：73-76
- 全文大小：674 K
文摘
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Adjustment of plasma properties for pulsed magnetron sputtering using unipolar/bipolar hybrid pulse mode
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Hardware solution for fast switching of pulse mode
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Adjustment of plasma properties freely between those of pure unipolar and bipolar pulse mode
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Influence of pulse mode ratio on film properties, especially the film stress for piezoelectric AlN thin films