Review: Developments in micro/nanoscale fabrication by focused ion beams

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• 作者：Chung-Soo Kim^a ; ^{reaves.kim@gmail.com} ; Sung-Hoon Ahn^a ; ^b ; ^{ahnsh@snu.ac.kr} ; Dong-Young Jang^c ;
• 关键词：Focused ion beam ; Micro/nanoscale structure fabrication ; Milling ; Deposition ; Implantation
• 刊名：Vacuum
• 出版年：2012
• 出版时间：29 February, 2012
• 年：2012
• 卷：86
• 期：8
• 页码：1014-1035
• 全文大小：3403 K

文摘

Focused ion beam (FIB) technology has become increasingly attractive for the fabrication of micro/nano structures for the purpose of the demands in industry and research. In this paper, various efforts to fabricate micro/nanoscale structure and geometrically complex structure are described, and their efficiency and structural stability are discussed. In order to fabricate such complex structures with micro/nanoscale features, the capability of the FIB is directly related to its destructive and constructive processes. It can also be used for modification and imaging in four basic modes. The fabrication processes, including both milling and deposition, are related to the precision fabrication of samples at the micro/nanoscale. By taking into account material processing rates, surface morphologies with nanoscale effects can be explained in detail. Finally, very recent developments using FIB will be reviewed.