The influence of the electron-beam exposure of SiO₂/Si and quartz substrates on the selective growth of graphene-like films

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• 作者：M.A. Knyazev ; D.M. Sedlovets ; ^{sedlovets@iptm.ru} ; O.V. Trofimov ; A.N. Redkin
• 关键词：А. Surfaces ; А. Thin films ; B. Chemical synthesis ; B. Vapor deposition ; С. Electron microscopy
• 刊名：Materials Research Bulletin
• 出版年：2017
• 出版时间：February 2017
• 年：2017
• 卷：86
• 期：Complete
• 页码：322-326
• 全文大小：1438 K
• 卷排序：86

文摘

CVD-growth is affected by the preliminary e-beam irradiation of the substrate. For SiO2 substrate, accumulated charge can affect the rate of CVD. Graphene-like thin films can be selectively grown on non-metal surface. Selectively grown films are transparent and have linear I-U characteristic.