PbxSn1 − xS thin films with x from 0.05 to 0.20 were hot wall deposited on glass.
The PbxSn1 − xS films were annealed in vacuum at 450 °C for 1 h.
Physical properties of the films were studied with respect to the Pb mole fraction x.
网站地图 | 常见问题 | 交通位置 | 联系我们 | OA远程办公 | English
© 2004-2018 中国地质图书馆版权所有 京ICP备05064691号 京公网安备11010802017129号
地址:北京市海淀区学院路29号 邮编:100083
电话:办公室:(+86 10)66554848;文献借阅、咨询服务、科技查新:66554700