Influence of annealing on microstructure and optical properties of hot wall deposited PbxSn(1 − x)S thin films
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文摘

PbxSn1 − xS thin films with x from 0.05 to 0.20 were hot wall deposited on glass.

The PbxSn1 − xS films were annealed in vacuum at 450 °C for 1 h.

Physical properties of the films were studied with respect to the Pb mole fraction x.

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